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1 Short courses in Chemistry in Estonia

2
University of Tartu4,3(123)
Tartu, Estonia Top 2% in Worldwide

Atomic layer deposition – the intersection of materials science, physics, chemistry and industry

Atomic Layer Deposition (ALD) is a thin-film deposition technique that plays a crucial role in advancing modern technologies, ranging from semiconductors and energy storage to coatings for medical devices and optical applications. Its unique ability to deposit ultra-thin films with atomic-level precision makes it a cornerstone of innovation in nanotechnology and materials science. 

Short Course Full-time On-campus
10 days$910/full
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